LB deposition of two different Langmuir materials onto the same substrate in an alternate layer structure can be performed using the Alternate-Layer LB Deposition Trough. Two compartments, each with an independently controlled compression barrier and Surface Pressure Sensor, allow two monolayers to be controlled completely independently.

Either of the two compartments of the trough can be used for LB deposition with one material alone if required, offering all the features of conventional LB Deposition Troughs. Each compartment has a subphase area of 30x20cm and a maximum monolayer containment area of 565cm².

The alternate-layer dipping mechanism has been designed to hold a glass microscope slide and can also be used to hold other small substrates of up to 3mm thickness.

The two separate trough compartments also allow the deposition of a single monolayer onto any substrate using the LB technique, avoiding the deposition of a second layer on the upstroke by emerging from the second subphase of pure water.

It is also possible to remove the alternate-layer dipping mechanism and use the supplied 75mm stroke conventional LB dipping mechanism instead. This is positioned at the centre of the trough edge and uses the entire trough area (68.5x20cm) with one monolayer material. The dipping well has dimensions of 120x120x80mm depth.

Langmuir-Schaefer deposition of a large number of both single and alternate layers is possible on this trough, using the optional Langmuir-Schaefer deposition kit.