The Extra-Large LB Deposition Trough has a subphase area of 68.5x20cm, a maximum monolayer containment area of 1300cm² and requires approximately 1.8l of liquid to form a subphase.This trough comes with a 75mm stroke LB dipping mechanism.

The large dipping well has dimensions of 120x120x80mm depth and is suitable for dipping onto whole silicon wafers of up to 115mm / 4.5" diameter, to a depth of 80mm.

A very large number of depositions on large substrates can be performed from one spread film on this trough.