The Small LB Deposition Trough has a subphase area of 15x7cm, a maximum monolayer containment area of 85cm² and requires approximately 70ml of liquid to form a subphase.

The dipping well has a 28mm diameter and 32mm depth. The LB dipping mechanism has a vertical stroke length of 40mm. This trough is ideal for deposition of small numbers of layers on substrates such as interdigitated electrode arrays used for electrical conductivity measurements, silicon wafers for Atomic Force Microscopy or glass for UV-visible absorbance measurements.

The size of the trough is ideal for studies of expensive, exotic materials or when worktop space is a large concern.